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Thin film of copper hexacyanoferrate dispersed on the surface of a conducting carbon ceramic material, SiO2/ZrO2/C-graphite: characteristics and electrochemical studies

机译:六氰合铁酸铜薄膜分散在导电碳陶瓷材料SiO2 / ZrO2 / C-石墨的表面:特性和电化学研究

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摘要

SiO2/ZrO2/C-graphite materials (SZC) were prepared by the sol-gel method presenting two compositions and designated as: (a) SZC30 (SiO2= 50%, ZrO2= 20%, C= 30%) and (b) SZC20 (SiO2 =60%, ZrO2= 20%, C= 20%) in wt.%. The material structure was investigated by X-ray diffraction (XRD), high resolution transmission electron microscopy (HR-TEM) and X-ray photoelectron spectroscopy (XPS). The electrical conductivities obtained for the pressed disks of these materials were 4 and 18 S cm-1 for SZC20 and SZC30, and the specific surface areas (determined by the BET method) of the carbon ceramic composites were 45 and 12 m² g-1, respectively. A copper hexacyanoferrate thin film was grown in situ on the material surface containing 30 wt.% C (SZC30). The thickness of the film was estimated as 110 nm. The midpoint potential for the redox process was dependent on the KCl supporting electrolyte concentrations in the range between 0.1 and 1.0 mol L-1 and the charge transfer resistance determined by electrochemical impedance spectroscopy experiment was 23.8 ohm cm².
机译:SiO2 / ZrO2 / C石墨材料(SZC)是通过溶胶-凝胶法制备的,具有两种成分,分别表示为:(a)SZC30(SiO2 = 50%,ZrO2 = 20%,C = 30%)和(b)以重量%计的SZC 20(SiO 2 = 60%,ZrO 2 = 20%,C = 20%)。通过X射线衍射(XRD),高分辨率透射电子显微镜(HR-TEM)和X射线光电子能谱(XPS)研究了材料结构。对于这些材料的压制圆盘,SZC20和SZC30的电导率分别为4和18 S cm-1,碳陶瓷复合材料的比表面积(通过BET法确定)为45和12m²g-1,分别。在含有30 wt。%C的材料表面上原位生长六氰合铁酸铜薄膜(SZC30)。膜的厚度估计为110nm。氧化还原过程的中点电势取决于KCl支持电解质的浓度,范围为0.1到1.0 mol L-1,通过电化学阻抗谱实验确定的电荷转移电阻为23.8 ohmcm²。

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